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Requirements analysis for digital shadows of production plant layouts

  • Global, competitive markets which are characterised by mass customisation and rapidly changing customer requirements force major changes in production styles and the configuration of manufacturing systems. As a result, factories may need to be regularly adapted and optimised to meet short-term requirements. One way to optimise the production process is the adaptation of the plant layout to the current or expected order situation. To determine whether a layout change is reasonable, a model of the current layout is needed. It is used to perform simulations and in the case of a layout change it serves as a basis for the reconfiguration process. To aid the selection of possible measurement systems, a requirements analysis was done to identify the important parameters for the creation of a digital shadow of a plant layout. Based on these parameters, a method is proposed for defining limit values and specifying exclusion criteria. The paper thus contributes to the development and application of systems that enable an automatic synchronisation of the real layout with the digital layout.

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Metadaten
Author of HS ReutlingenHummel, Vera; Hermann, Julian
DOI:https://doi.org/10.1007/978-3-030-90700-6_39
ISBN:978-3-030-90699-3
ISBN:978-3-030-90700-6
Erschienen in:Towards sustainable customization: bridging smart products and manufacturing systems : Proceedings of the 8th Changeable, Agile, Reconfigurable and Virtual Production Conference (CARV2021) and the 10th World Mass Customization & Personalization Conference (MCPC2021), Aalborg, Denmark, October/November 2021
Publisher:Springer
Place of publication:Cham
Document Type:Conference proceeding
Language:English
Publication year:2022
Tag:digital shadow; facility layout; plant layout; requirements analysis
Page Number:9
First Page:347
Last Page:355
PPN:Im Katalog der Hochschule Reutlingen ansehen
DDC classes:620 Ingenieurwissenschaften und Maschinenbau
Open access?:Nein
Licence (German):License Logo  In Copyright - Urheberrechtlich geschützt