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Employing diffuse reflection ultraviolet visible (UV–Vis) spectroscopy we developed an approach that is capable to quantitatively determine flux residues on a technical copper surface. The technical copper surface was soldered with a no-clean flux system of organic acids. By a post-solder cleaning step with different cleaning parameters, various levels of residues were produced. The surface was quantitatively and qualitatively characterized using X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), Fourier transform infrared spectroscopy (FTIR) and diffuse reflection UV–Vis spectroscopy. With the use of a multivariate analysis (MVA) we examined the UV–Vis data to create a correlation to the carbon content on the surface. The UV–Vis data could be discriminated for all groups by their level of organic residues. Combined with XPS the data were evaluated by a partial least squares (PLS) regression to establish a model. Based on this predictive model, the carbon content was calculated with an absolute error of 2.7 at.%. Due to the high correlation of predictive model, the easy-to-use measurement and the evaluation by multivariate analysis the developed method seems suitable for an online monitoring system. With this system, flux residues can be detected in a manufacturing cleaning process of technical surfaces after soldering.
We report an investigation into the distribution of copper oxidation states in oxide films formed on the surfaces of technical copper. The oxide films were grown by thermal annealing at ambient conditions and studied using Auger depth profiling and UV–Vis spectroscopy. Both Auger and UV–Vis data were evaluated applying multivariate curve resolution (MCR). Both experimental techniques revealed that the growth of Cu2O dominates the initial ca. 40 nm of oxide films grown at 175 °C, while further oxide growth is dominated by CuO formation. The largely coincident results from both experimental approaches demonstrates the huge benefit of the application of UV–Vis spectroscopy in combination with MCR analysis, which provides access to information on chemical state distributions without the need for destructive sample analysis. Both approaches are discussed in detail.