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Influence of metallization layout on aging detector lifetime under cyclic thermo-mechanical stress
(2016)
The influence of the layout on early warning detectors in BCD technologies for metallization failure under cyclic thermo-mechanical stress was investigated. Different LDMOS transistors, with narrow or wide metal fingers and with or without embedded detectors, were used. The test structures were repeatedly stressed by pronounced self-heating until failure (a short circuit) was detected. The results show that the layout of the on-chip metallization has a large impact on the lifetime. A significant influence of the detectors on the lifetime was also observed, in our case causing a reduction of more than a factor of two, but only for the test structure with narrow metal fingers. The experimental results are explained by an efficient numerical thermo mechanical simulation approach, giving detailed insights into the strain distribution in the metal system. These results are important for aging detector design and, morever, for LDMOS on-chip metal layout in general.
In many automotive applications, repetitive selfheating is the most critical operation condition for LDMOS transistors in smart power ICs. This is attributed to thermomechanical stress in the on-chip metallization, which results from the different thermal expansion coefficients of the metal and the intermetal dielectric. After many cycles, the accumulated strain in the metallization can lead to short circuits, thus limiting the lifetime. Increasing the LDMOS size can help to lower peak temperatures and therefore to reduce the stress. The downside of this is a higher cost. Hence, it has been suggested to use resilient systems that monitor the LDMOS metallization and lower the stress once a certain level of degradation is reached. Then, lifetime requirements can be fulfilled without oversizing LDMOS transistors, even though a certain performance loss has to be accepted. For such systems, suitable sensors for metal degradation are required. This work proposes a floating metal line embedded in the LDMOS metallization. The suitability of this approach has been investigated experimentally by test structures and shown to be a promising candidate. The obtained results will be explained by means of numerical thermo-mechanical simulations.