Refine
Document Type
- Conference proceeding (36)
- Journal article (7)
- Book chapter (3)
- Book (2)
Is part of the Bibliography
- yes (48)
Institute
- Technik (48)
Publisher
- IEEE (18)
- Hochschule Ulm (6)
- ACM (4)
- Springer (4)
- VDE Verlag GmbH (3)
- Arbeitsgemeinschaft Simulation (ASIM) (2)
- VDE-Verlag (2)
- Cadence Design Systems (1)
- Elsevier (1)
- MDPI (1)
Despite 30 years of Electronic Design Automation, analog IC layouts are still handcrafted in a laborious fashion today due to the complex challenge of considering all relevant design constraints. This paper presents Self-organized Wiring and Arrangement of Responsive Modules (SWARM), a novel approach addressing the problem with a multi-agent system: autonomous layout modules interact with each other to evoke the emergence of overall compact arrangements that fit within a given layout zone. SWARM´s unique advantage over conventional optimization-based and procedural approaches is its ability to consider crucial design constraints both explicitly and implicitly. Several given examples show that by inducing a synergistic flow of self-organization, remarkable layout results can emerge from SWARM’s decentralized decision-making model.
Physical analog IC design has not been automated to the same degree as digital IC design. This shortfall is primarily rooted in the analog IC design problem itself, which is considerably more complex even for small problem sizes. Significant progress has been made in analog automation in several R&D target areas in recent years. Constraint engineering and generator-based module approaches are among the innovations that have emerged. Our paper will first present a brief review of the state of the art of analog layout automation. We will then introduce active and open research areas and present two visions – a “continuous layout design flow” and a “bottom-up meets top-down design flow” – which could significantly push analog design automation towards its goal of analog synthesis.
This paper introduces a novel placement methodology for a common-centroid (CC) pattern generator. It can be applied to various integrated circuit (IC) elements, such as transistors, capacitors, diodes, and resistors. The proposed method consists of a constructive algorithm which generates an initial, close to the optimum, solution, and an iterative algorithm which is used subsequently, if the output of constructive algorithm does not satisfy the desired criteria. The outcome of this work is an automatic CC placement algorithm for IC element arrays. Additionally, the paper presents a method for the CC arrangement evaluation. It allows for evaluating the quality of an array, and a comparison of different placement methods.
A new method for the analysis of movement dependent parasitics in full custom designed MEMS sensors
(2017)
Due to the lack of sophisticated microelectromechanical systems (MEMS) component libraries, highly optimized MEMS sensors are currently designed using a polygon driven design flow. The strength of this design flow is the accurate mechanical simulation of the polygons by finite element (FE) modal analysis. The result of the FE-modal analysis is included in the system model together with the data of the (mechanical) static electrostatic analysis. However, the system model lacks the dynamic parasitic electrostatic effects, arising from the electric coupling between the wiring and the moving structures. In order to include these effects in the system model, we present a method which enables the quasi dynamic parasitic extraction with respect to in-plane movements of the sensor structures. The method is embedded in the polygon driven MEMS design flow using standard EDA tools. In order to take the influences of the fabrication process into account, such as etching process variations, the method combines the FE-modal analysis and the fabrication process simulation data. This enables the analysis of dynamic changing electrostatic parasitic effects with respect to movements of the mechanical structures. Additionally, the result can be included into the system model allowing the simulation of positive feedback of the electrostatic parasitic effects to the mechanical structures.
We present a new methodology for automatic selection and sizing of analog circuits demonstrated on the OTA circuit class. The methodology consists of two steps: a generic topology selection method supported by a “part-sizing” process and subsequent final sizing. The circuit topologies provided by a reuse library are classified in a topology tree. The appropriate topology is selected by traversing the topology tree starting at the root node. The decision at each node is gained from the result of the part-sizing, which is in fact a node-specific set of simulations. The final sizing is a simulation-based optimization. We significantly reduce the overall simulation effort compared to a classical simulation-based optimization by combining the topology selection with the part-sizing process in the selection loop. The result is an interactive user friendly system, which eases the analog designer’s work significantly when compared to typical industrial practice in analog circuit design. The topology selection method and sizing process are implemented as a tool into a typical analog design environment. The design productivity improvement achievable by our method is shown by a comparison to other design automation approaches.
Layout generators, commonly denoted as PCells (parameterized cells), play an important role in the layout design of analog ICs (integrated circuits). PCells can automatically create parts of a layout, whose properties are controlled by the PCell parameters. Any layout, whether hand-crafted or automatically generated, has to be verified against design rules using a DRC (design rule check) in order to assure proper functionality and producibility. Due to the growing complexity of today’s PCells it would be beneficial if a PCell itself could be ensured to produce DRC clean layouts for any allowed parameter values, i.e. a formal verification of the PCell’s code rather than checking all possible instances of the PCell. In this paper we demonstrate the feasibility of such a formal PCell verification for a simple NMOS transistor PCell. The set from which the parameter values can be chosen was found during the verification process.
The hotspot detection has received much attention in the recent years due to a substantial mismatch between lithography wavelength and semiconductor technology feature size. This mismatch causes diffraction when transferring the layout from design onto a silicon wafer. As a result, open or short circuits (i.e. lithography hotspots) are more likely to be produced. Additionally, increasing numbers of semiconductors devices on a wafer required more time for the lithography hotspot detection analysis. In this work, we propose a fast and accurate solution based on novel artificial neural network (ANN) architecture for precise lithography hotspot detection using a convolution neural network (CNN) adopting a state of-the-art technique. The experimental results showed that the proposed model gained accuracy improvement over current state-of-theart approaches. The final code has been made publicly available.
Due to the lack of sophisticated component libraries for microelectromechanical systems (MEMS), highly optimized MEMS sensors are currently designed using a polygon driven design flow. The advantage of this design flow is its accurate mechanical simulation, but it lacks a method for analyzing the dynamic parasitic electrostatic effects arising from the electric coupling between (stationary) wiring and structures in motion. In order to close this gap, we present a method that enables the parasitics arising from in-plane, sensor-structure motion to be extracted quasi-dynamically. With the method's structural-recognition feature we can analyze and optimize dynamic parasitic electrostatic effects.
Electromigration (EM) is becoming a progressively severe reliability challenge due to increased interconnect current densities. A shift from traditional (post-layout) EM verification to robust (pro-active) EM aware design - where the circuit layout is designed with individual EM-robust solutions - is urgently needed. This tutorial will give an overview of EM and its effects on the reliability of present and future integrated circuits (ICs). We introduce the physical EM process and present its specific characteristics that can be affected during physical design. Examples of EM countermeasures which are applied in today’s commercial design flows are presented. We show how to improve the EM-robustness of metallization patterns and we also consider mission proiles to obtain application-oriented current density limits. The increasing interaction of EM with thermal migration is investigated as well. We conclude with a discussion of application examples to shift from the current post layout EM verification towards an EM aware physical design process. Its methodologies, such as EM-aware routing, increase the EM-robustness of the layout with the overall goal of reducing the negative impact of EM on the circuit’s reliability.
A procedural approach to automate the manual design process in analog integrated circuit design
(2018)
This paper presents a novel approach to automating the design of analog integrated circuits: (1) the Expert Design Plan (EDP), a procedural generator, and (2) the EDP Language, a high-level description language for writing an EDP. An EDP is a parameterizable, executable script, which reproduces a designer’s course of action when designing a circuit. Thus, an EDP formalizes the design expert’s knowledge-based strategy and makes it reusable. Since it is essential that an EDP represents a circuit designers’ way of thinking and working as close as possible, the designers themselves should be enabled to create the EDP. Therefore, our approach provides a input method through a domain-specific language called EDP Language (EDPL). Using this language is intuitive and requires no special training. In an exemplary implementation of our approach, a common-source amplifier is automatically sized using a set of only 10 instructions. Even in the first usage our EDP approach has appeared to be more efficient than the manual sizing process.