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Modern power DMOS transistors greatly benefit from the continuous advances of the technology, which yield devices with very low area-specific RDS,on figures of merit and therefore allow for significantly reduced active areas. However, in many applications, where the devices must dissipate high amounts of energy and thus are subjected to significant self-heating, the active area is not dictated by RDS,on requirements, but by the energy constraints. In this paper, a simple method of improving the energy capability and reliability of power DMOS transistors operating in pulsed conditions is proposed and experimentally verified. The method consists in redistributing the power density from the hotter to the cooler device regions, hence achieving a more homogeneous temperature distribution and a reduced peak temperature. To demonstrate the principle, a simple gate offset circuit is used to redistribute the current density to the cooler DMOS parts. No technology changes are needed for the implementation, only minor changes to the driver circuit are necessary, with a minimal impact on the additional required active area. Improvements in the energy capability from 9.2% up to 39% have been measured. Furthermore, measurements have shown that the method remains effective also if the operating conditions change significantly. The simplicity and the effectiveness of the implementation makes the proposed method suitable to be used in a wide range of applications.
LDMOS transistors in integrated power technologies are often subject to thermo-mechanical stress, which degrades the on-chip metallization and eventually leads to a short. This paper investigates small sense lines embedded in the LDMOS metallization. It will be shown that their resistance depends strongly on the stress cycle number. Thus, they can be used as aging sensors and predict impending failures. Different test structures have been investigated to identify promising layout configurations. Such sensors are key components for resilient systems that adaptively reduce stress to allow aggressive LDMOS scaling without increasing the risk of failure.
On-chip metallization, especially in modern integrated BCD technologies, is often subject to high current densities and pronounced temperature cycles due to heat dissipation from power switches like LDMOS transistors. This paper continues the work on a sensor concept where small sense lines are embedded in the metallization layers above the active area of a switching LDMOS transistor. The sensors show a significant resistance change that correlates with the number of power cycles. Furthermore, influences of sense line layer, geometry and the dissipated energy are shown. In this paper, the focus lies on a more detailed analysis of the observed change in sense line resistance.