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Die kontinuierliche Erfassung von Qualitätsparametern ist eine zunehmende Anforderung in der Polymerextrusion. Die optische Spektroskopie kann diese Anforderung erfüllen, da sie neben der Farbe weitere Parameter wie beispielsweise chemische Eigenschaften, Trübungsgrad oder Partikelgröße erfasst. Dabei werden für Inline-Messungen im Extruder optische Sonden eingesetzt. Im laufenden Betrieb bilden sich Ablagerungen auf den Sondenfenstern. Dieser Beitrag präsentiert ein neues Cleaning in Place Konzept, mit dessen Hilfe die Fenster auch während der Produktion ohne Unterbrechung gereinigt werden können. Auch die Kalibrierung der Messtechnik ist dabei möglich. Das verhindert Rüstzeiten und sichert eine kontinuierliche Inline-Messung.
An ultraviolet visible (UV–Vis) spectroscopy method was developed that can quantitatively characterize a technical copper surface to determine oxide layers and organic impurities. The oxide layers were produced by a heating step at 175 ℃ for four different times (range = 1–10 min). Partial least squares (PLS) regression was used to establish a relation between the UV–Vis spectra and film thickness measurements using Auger electron spectroscopy depth profiles. The validation accuracy of the regression is in the range of approximately 2.3 nm. The prediction model allowed obtaining an estimation of the oxide layer thickness with an absolute error of 2.9 nm. Alternatively, already known methods cannot be used because of the high roughness of the technical copper surfaces. An integrating sphere is used to measure the diffuse reflectance of these surfaces, providing an average over all angles of illumination and observation.
Water jacket systems are routinely used to control the temperature of Petri dish cell culture chambers. Despite their widespread use, the thermal characteristics of such systems have not been fully investigated. In this study, we conducted a comprehensive set of theoretical, numerical and experimental analyses to investigate the thermal characteristics of Petri dish chambers under stable and transient conditions. In particular, we investigated the temperature gradient along the radial axis of the Petri dish under stable conditions, and the transition period under transient conditions. Our studies indicate a radial temperature gradient of 3.3 °C along with a transition period of 27.5 min when increasing the sample temperature from 37 to 45 °C for a standard 35 mm diameter Petri dish. We characterized the temperature gradient and transition period under various operational, geometric, and environmental conditions. Under stable conditions, reducing the diameter of the Petri dish and incorporating a heater underneath the Petri dish can effectively reduce the temperature gradient across the sample. In comparison, under transient conditions, reducing the diameter of the Petri dish, reducing sample volume, and using glass Petri dish chambers can reduce the transition period.
We report on the reflectance, transmittance and fluorescence spectra (λ=200–1200nm) of four types of chicken eggshells (white, brown, light green, dark green) measured in situ without pretreatment and after ablation of 20–100 μm of the outer shell regions. The color pigment protoporphyrin IX (PPIX) is embedded in the protein phase of all four shell types as highly fluorescent monomers, in the white and light green shells additionally as non-fluorescent dimers, and in the brown and dark green shells mainly as non-fluorescent poly-aggregates. The green shell colors are formed from an approximately equimolar mixture of PPIX and biliverdin. The axial distribution of protein and color pigments were evaluated from the combined reflectances of both the outer and inner shell surfaces, as well as from the transmittances. For the data generation we used the radiative transfer model in the random walk and Kubelka-Munk approaches.
The detection and characterisation of oxide layers on metallic copper samples plays an important role for power electronic modules in the automotive industry. However, since precise identification of oxide layers by visual inspection is difficult and time consuming due to inhomogeneous colour distribution, a reliable and efficient method for estimating their thickness is needed. In this study, hyperspectral imaging in the visible wavelength range (425–725 nm) is proposed as an in-line inspection method for analysing oxide layers in real-time during processing of copper components such as printed circuit boards in the automotive industry. For implementation in the production line a partial least square regression (PLSR) model was developed with a calibration set of n = 12 with about 13,000 spectra per sample to determine the oxide layer thickness on top of the technical copper surfaces. The model shows a good prediction performance in the range of 0–30 nm compared to Auger electron spectroscopy depth profiles as a reference method. The root mean square error (RMSE) is 1.75 nm for calibration and 2.70 nm for full cross validation. Applied to an external dataset of four new samples with about 13,000 spectra per sample the model provides an RMSE of 1.84 nm for prediction and demonstrates the robustness of the model during real-time processing. The results of this study prove the ability and usefulness of the proposed method to estimate the thickness of oxide layers on technical copper. Hence, the application of hyperspectral imaging for the industrial process control of electronic devices is very promising.
A new two-dimensional fluorescence sensor system was developed for in-line monitoring of mammalian cell cultures. Fluorescence spectroscopy allows for the detection and quantification of naturally occurring intra- and extracellular fluorophores in the cell broth. The fluorescence signals correlate the the cells' current redox state and other relevant process parameters. Cell culture pretests with twelve different excitation wavelengths showed that only three wavelengths account for a vast majority of spectral variation. Accordingly, the newly developed device utilizes three high-power LEDs as excitation sources in combination with a back-thinned CCD-spectrometer for fluorescence detection.
We report an investigation into the distribution of copper oxidation states in oxide films formed on the surfaces of technical copper. The oxide films were grown by thermal annealing at ambient conditions and studied using Auger depth profiling and UV–Vis spectroscopy. Both Auger and UV–Vis data were evaluated applying multivariate curve resolution (MCR). Both experimental techniques revealed that the growth of Cu2O dominates the initial ca. 40 nm of oxide films grown at 175 °C, while further oxide growth is dominated by CuO formation. The largely coincident results from both experimental approaches demonstrates the huge benefit of the application of UV–Vis spectroscopy in combination with MCR analysis, which provides access to information on chemical state distributions without the need for destructive sample analysis. Both approaches are discussed in detail.
An apparatus and method for analyzing a flow of material having an inlet region, a measurement range and an outlet region, and having a first diverter and a second diverter, and a deflection area, wherein in a first state of operation, the two diverters form a continuous first material flow space from the inlet region via the first diverter through the measurement range, via the second diverter to the outlet region, and in a second state of operation, form a continuous second material flow space from the inlet region via the first diverter through the deflection area, via the second diverter to the outlet region.
Die Erfindung betrifft eine Vorrichtung und Verfahren zur Analyse eines Materialstroms S mit einem Einlassbereich E, einem Messbereich M und einen Auslassbereich A sowie mit einer ersten Weiche W1 und einer zweiten Weiche W2 und einem Umlenkbereich U, wobei die beiden Weichen W1, W2 in einem ersten Schaltzustand Z1 einen durchgängigen ersten Materialdurchströmungsraum vom Einlassbereich E über die erste Weiche W1 durch den Messbereich M über die zweite Weiche W2 bis zum Auslassbereich A ausbilden und in einem zweiten Schaltzustand einen durchgängigen zweiten Materialdurchströmungsraum vom Einlassbereich E über die erste Weiche W1 durch den Umkenkbereich U über die zweite Weiche W2 bis zum Auslassbereich A ausbilden.
Die Erfindung betrifft eine Vorrichtung und Verfahren zur Analyse eines Materialstroms (S) mit einem Einlassbereich (E), einem Messbereich (M) und einen Auslassbereich (A) sowie mit einer ersten Weiche (W1) und einer zweiten Weiche (W2) und einem Umlenkbereich (U), wobei die beiden Weichen (W1, W2) in einem ersten Schaltzustand (Z1) einen durchgängigen ersten Materialdurchströmungsraum vom Einlassbereich (E) über die erste Weiche (W1) durch den Messbereich (M) über die zweite Weiche (W2) bis zum Auslassbereich (A) ausbilden und in einem zweiten Schaltzustand einen durchgängigen zweiten Materialdurchströmungsraum vom Einlassbereich (E) über die erste Weiche (W1) durch den Umlenkbereich (U) über die zweite Weiche (W2) bis zum Auslassbereich (A) ausbilden.
