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We report on the reflectance, transmittance and fluorescence spectra (λ=200–1200nm) of four types of chicken eggshells (white, brown, light green, dark green) measured in situ without pretreatment and after ablation of 20–100 μm of the outer shell regions. The color pigment protoporphyrin IX (PPIX) is embedded in the protein phase of all four shell types as highly fluorescent monomers, in the white and light green shells additionally as non-fluorescent dimers, and in the brown and dark green shells mainly as non-fluorescent poly-aggregates. The green shell colors are formed from an approximately equimolar mixture of PPIX and biliverdin. The axial distribution of protein and color pigments were evaluated from the combined reflectances of both the outer and inner shell surfaces, as well as from the transmittances. For the data generation we used the radiative transfer model in the random walk and Kubelka-Munk approaches.
The detection and characterisation of oxide layers on metallic copper samples plays an important role for power electronic modules in the automotive industry. However, since precise identification of oxide layers by visual inspection is difficult and time consuming due to inhomogeneous colour distribution, a reliable and efficient method for estimating their thickness is needed. In this study, hyperspectral imaging in the visible wavelength range (425–725 nm) is proposed as an in-line inspection method for analysing oxide layers in real-time during processing of copper components such as printed circuit boards in the automotive industry. For implementation in the production line a partial least square regression (PLSR) model was developed with a calibration set of n = 12 with about 13,000 spectra per sample to determine the oxide layer thickness on top of the technical copper surfaces. The model shows a good prediction performance in the range of 0–30 nm compared to Auger electron spectroscopy depth profiles as a reference method. The root mean square error (RMSE) is 1.75 nm for calibration and 2.70 nm for full cross validation. Applied to an external dataset of four new samples with about 13,000 spectra per sample the model provides an RMSE of 1.84 nm for prediction and demonstrates the robustness of the model during real-time processing. The results of this study prove the ability and usefulness of the proposed method to estimate the thickness of oxide layers on technical copper. Hence, the application of hyperspectral imaging for the industrial process control of electronic devices is very promising.
A new two-dimensional fluorescence sensor system was developed for in-line monitoring of mammalian cell cultures. Fluorescence spectroscopy allows for the detection and quantification of naturally occurring intra- and extracellular fluorophores in the cell broth. The fluorescence signals correlate the the cells' current redox state and other relevant process parameters. Cell culture pretests with twelve different excitation wavelengths showed that only three wavelengths account for a vast majority of spectral variation. Accordingly, the newly developed device utilizes three high-power LEDs as excitation sources in combination with a back-thinned CCD-spectrometer for fluorescence detection.
We report an investigation into the distribution of copper oxidation states in oxide films formed on the surfaces of technical copper. The oxide films were grown by thermal annealing at ambient conditions and studied using Auger depth profiling and UV–Vis spectroscopy. Both Auger and UV–Vis data were evaluated applying multivariate curve resolution (MCR). Both experimental techniques revealed that the growth of Cu2O dominates the initial ca. 40 nm of oxide films grown at 175 °C, while further oxide growth is dominated by CuO formation. The largely coincident results from both experimental approaches demonstrates the huge benefit of the application of UV–Vis spectroscopy in combination with MCR analysis, which provides access to information on chemical state distributions without the need for destructive sample analysis. Both approaches are discussed in detail.
An apparatus and method for analyzing a flow of material having an inlet region, a measurement range and an outlet region, and having a first diverter and a second diverter, and a deflection area, wherein in a first state of operation, the two diverters form a continuous first material flow space from the inlet region via the first diverter through the measurement range, via the second diverter to the outlet region, and in a second state of operation, form a continuous second material flow space from the inlet region via the first diverter through the deflection area, via the second diverter to the outlet region.
Die Erfindung betrifft eine Vorrichtung und Verfahren zur Analyse eines Materialstroms S mit einem Einlassbereich E, einem Messbereich M und einen Auslassbereich A sowie mit einer ersten Weiche W1 und einer zweiten Weiche W2 und einem Umlenkbereich U, wobei die beiden Weichen W1, W2 in einem ersten Schaltzustand Z1 einen durchgängigen ersten Materialdurchströmungsraum vom Einlassbereich E über die erste Weiche W1 durch den Messbereich M über die zweite Weiche W2 bis zum Auslassbereich A ausbilden und in einem zweiten Schaltzustand einen durchgängigen zweiten Materialdurchströmungsraum vom Einlassbereich E über die erste Weiche W1 durch den Umkenkbereich U über die zweite Weiche W2 bis zum Auslassbereich A ausbilden.
Die Erfindung betrifft eine Vorrichtung und Verfahren zur Analyse eines Materialstroms (S) mit einem Einlassbereich (E), einem Messbereich (M) und einen Auslassbereich (A) sowie mit einer ersten Weiche (W1) und einer zweiten Weiche (W2) und einem Umlenkbereich (U), wobei die beiden Weichen (W1, W2) in einem ersten Schaltzustand (Z1) einen durchgängigen ersten Materialdurchströmungsraum vom Einlassbereich (E) über die erste Weiche (W1) durch den Messbereich (M) über die zweite Weiche (W2) bis zum Auslassbereich (A) ausbilden und in einem zweiten Schaltzustand einen durchgängigen zweiten Materialdurchströmungsraum vom Einlassbereich (E) über die erste Weiche (W1) durch den Umlenkbereich (U) über die zweite Weiche (W2) bis zum Auslassbereich (A) ausbilden.
The critical process parameters cell density and viability during mammalian cell cultivation are assessed by UV/VIS spectroscopy in combination with multivariate data analytical methods. This direct optical detection technique uses a commercial optical probe to acquire spectra in a label-free way without signal enhancement. For the cultivation, an inverse cultivation protocol is applied, which simulates the exponential growth phase by exponentially replacing cells and metabolites of a growing Chinese hamster ovary cell batch with fresh medium. For the simulation of the death phase, a batch of growing cells is progressively replaced by a batch with completely starved cells. Thus, the most important parts of an industrial batch cultivation are easily imitated. The cell viability was determined by the well-established method partial least squares regression (PLS). To further improve process knowledge, the viability has been determined from the spectra based on a multivariate curve resolution (MCR) model. With this approach, the progress of the cultivations can be continuously monitored solely based on an UV/VIS sensor. Thus, the monitoring of critical process parameters is possible inline within a mammalian cell cultivation process, especially the viable cell density. In addition, the beginning of cell death can be detected by this method which allows us to determine the cell viability with acceptable error. The combination of inline UV/VIS spectroscopy with multivariate curve resolution generates additional process knowledge complementary to PLS and is considered a suitable process analytical tool for monitoring industrial cultivation processes.
Hyperspectral imaging opens a wide field of applications. It is a well established technique in agriculture, medicine, mineralogy and many other fields. Most commercial hyperspectral sensors are able to record spectral information along one spatial dimension in a single acquisition. For the second spatial dimension a scan is required. Beside those systems there is a novel technique allowing to sense a two dimensional scene and its spectral information within one shot. This increases the speed of hyperspectral imaging, which is interesting for metrology tasks under rough environmental conditions. In this article we present a detailed characterization of such a snapshot sensor for later use in a snapshot full field chromatic confocal system. The sensor (Ximea MQ022HG-IM-SM5X5-NIR) is based on the so called snapshot mosaic technique, which offers 25 bands mapped to one so called macro pixel. The different bands are realized by a spatially repeating pattern of Fabry-Pèrot flters. Those filters are monolithically fabricated on the camera chip.
A systematic study using a central composite design of experiments (DoE) was performed on the oxygen plasma surface modifications of two different polymers—Pellethane 2363-55DE, which is a polyurethane, and vinyltrimethoxysilane-grafted ethylene-propylene (EPR-g-VTMS), a cross-linked ethylene-propylene rubber. The impacts of four parameters—gas pressure, generator power, treatment duration, and process temperature—were assessed, with static contact angles and calculated surface free energies (SFEs) as the main responses in the DoE. The plasma effects on the surface roughness and chemistry were determined using scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Through the sufficiently accurate DoE model evaluation, oxygen gas pressure was established as the most impactful factor, with the surface energy and polarity rising with falling oxygen pressure. Both polymers, though different in composition, exhibited similar modification trends in surface energy rise in the studied system. The SEM images showed a rougher surface topography after low pressure plasma treatments. XPS and subsequent multivariate data analysis of the spectra established that higher oxidized species were formed with plasma treatments at low oxygen pressures of 0.2 mbar.