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Flame retardants based on amino silanes and phenylphosphonic acid

  • The sol-gel approach offers a new class of flame retardants with a high potential for textile applications. Pure inorganic sol-gel systems do, however, typically not provide an effect sufficient for a sel-fextinguishing behavior on its own. We therefore employed compounds with nitrogen and phosphorous containing groups. Especially the combination of compounds with both elements, using the synergism, is promising for the aim to find well-applicable, environmental friendly, halogen-free flame retardants. In our approach, the sol-gel network ensured on the one hand the link to the textile as nonflammable binder. On the other hand, the sol-gel-based networks modified with functional groups containing nitrogen groups provided flame retardancy. In this way, a flame retardant finishing for textiles could be obtained by simple finishing techniques as, e.g., padding. Besides a characterization with various flame tests (e.g., according to EN ISO 15025 e protective clothing), we used a combination of cone calorimetry, thermogravimetry coupled with infrared spectroscopy analysis and scanning electron microscopy to analyze the mechanism of flame retardancy. Thus, we could show that the main mechanism is based on the formation of a protection layer. This work provides a model system for sol-gel-based flame retardants and has the potential to show the principle feasibility of the sol-gel approach in flame retardancy of textiles. It therefore lays the groundwork for tailoring sol-gel layers from newly synthesized sol-gel precursors containing nitrogen and phosphorous groups.

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Metadaten
Name:Textor, Torsten
DOI:https://doi.org/10.1016/j.polymdegradstab.2016.04.012
ISSN:0141-3910
Erschienen in:Polymer degradation and stability
Publisher:Elsevier
Place of publication:Amsterdam
Document Type:Article
Language:English
Year of Publication:2016
Tag:alkoxysilanes; halogen-free flame retardants; nanosols; sol-gel technique; textile finishing
Volume:129
Pagenumber:12
First Page:168
Last Page:179
Dewey Decimal Classification:540 Chemie
Open Access:Nein
Licence (German):License Logo  Lizenzbedingungen Elsevier